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Evaluation of megasonic cleaning systems for particle removal efficiency and damaging

dc.contributor.authorVereecke, Guy
dc.contributor.authorHolsteyns, Frank
dc.contributor.authorVeltens, Tom
dc.contributor.authorLux, Marcel
dc.contributor.authorArnauts, Sophia
dc.contributor.authorKenis, Karine
dc.contributor.authorVos, Rita
dc.contributor.authorMertens, Paul
dc.contributor.authorHeyns, Marc
dc.date.accessioned2021-10-15T17:36:28Z
dc.date.available2021-10-15T17:36:28Z
dc.date.issued2004
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/9860
dc.sourceIIOimport
dc.titleEvaluation of megasonic cleaning systems for particle removal efficiency and damaging
dc.typeProceedings paper
dc.contributor.imecauthorVereecke, Guy
dc.contributor.imecauthorHolsteyns, Frank
dc.contributor.imecauthorLux, Marcel
dc.contributor.imecauthorArnauts, Sophia
dc.contributor.imecauthorKenis, Karine
dc.contributor.imecauthorVos, Rita
dc.contributor.imecauthorMertens, Paul
dc.contributor.imecauthorHeyns, Marc
dc.contributor.orcidimecVereecke, Guy::0000-0001-9058-9338
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage145
dc.source.endpage152
dc.source.conferenceCleaning Technology in Semiconductor Device Manufacturing VIII. Proceedings of the International Symposium
dc.source.conferencedate13/10/2003
dc.source.conferencelocationOrlando, FL USA
imec.availabilityPublished - open access
imec.internalnotesElectrochemical Society Proceedings; Vol. 2003-26


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