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Wafer backside cleaning strategies for high-k/metal gate processing

dc.contributor.authorVos, Rita
dc.contributor.authorKesters, Els
dc.contributor.authorGaraud, Sylvain
dc.contributor.authorDe Waele, Rita
dc.contributor.authorKenis, Karine
dc.contributor.authorLux, Marcel
dc.contributor.authorKraus, Harald
dc.contributor.authorSnow, Jim
dc.contributor.authorShamiryan, Denis
dc.contributor.authorCatana, Gabriela
dc.contributor.authorDeweerd, Wim
dc.contributor.authorSchram, Tom
dc.contributor.authorDe Gendt, Stefan
dc.contributor.authorMertens, Paul
dc.date.accessioned2021-10-15T17:46:24Z
dc.date.available2021-10-15T17:46:24Z
dc.date.issued2004
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/9891
dc.sourceIIOimport
dc.titleWafer backside cleaning strategies for high-k/metal gate processing
dc.typeOral presentation
dc.contributor.imecauthorVos, Rita
dc.contributor.imecauthorKesters, Els
dc.contributor.imecauthorKenis, Karine
dc.contributor.imecauthorLux, Marcel
dc.contributor.imecauthorSchram, Tom
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.imecauthorMertens, Paul
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.source.peerreviewno
dc.source.conference7th International Symposium Ultra-clean Processing of Silicon - UCPSS
dc.source.conferencedate20/09/2004
dc.source.conferencelocationLeuven Belgium
imec.availabilityPublished - imec


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