Sealing of porous low-k dielectrics: an ellipsometric porosimetry study of UV-O3 oxidized SiOxCy films
dc.contributor.author | Whelan, Caroline | |
dc.contributor.author | Le, Quoc Toan | |
dc.contributor.author | Cecchet, Francesca | |
dc.contributor.author | Satta, Alessandra | |
dc.contributor.author | Pireaux, Jean-Jacques | |
dc.contributor.author | Rudolf, Petra | |
dc.contributor.author | Maex, Karen | |
dc.date.accessioned | 2021-10-15T17:54:31Z | |
dc.date.available | 2021-10-15T17:54:31Z | |
dc.date.issued | 2004 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/9916 | |
dc.source | IIOimport | |
dc.title | Sealing of porous low-k dielectrics: an ellipsometric porosimetry study of UV-O3 oxidized SiOxCy films | |
dc.type | Journal article | |
dc.contributor.imecauthor | Le, Quoc Toan | |
dc.contributor.imecauthor | Maex, Karen | |
dc.contributor.orcidimec | Le, Quoc Toan::0000-0002-0206-6279 | |
dc.source.peerreview | no | |
dc.source.beginpage | F8 | |
dc.source.endpage | F10 | |
dc.source.journal | Electrochemical and Solid-State Letters | |
dc.source.issue | 2 | |
dc.source.volume | 7 | |
imec.availability | Published - imec |
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