Show simple item record

dc.contributor.authorXu, Kaidong
dc.contributor.authorVos, Rita
dc.contributor.authorVereecke, Guy
dc.contributor.authorMertens, Paul
dc.contributor.authorHeyns, Marc
dc.contributor.authorVinckier, Chris
dc.contributor.authorFransaer, Jan
dc.date.accessioned2021-10-15T18:04:35Z
dc.date.available2021-10-15T18:04:35Z
dc.date.issued2004
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/9946
dc.sourceIIOimport
dc.titleMechanisms of particle removal during brush scrubber cleaning
dc.typeProceedings paper
dc.contributor.imecauthorVos, Rita
dc.contributor.imecauthorVereecke, Guy
dc.contributor.imecauthorMertens, Paul
dc.contributor.imecauthorHeyns, Marc
dc.contributor.orcidimecVereecke, Guy::0000-0001-9058-9338
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage137
dc.source.endpage144
dc.source.conferenceCleaning Technology in Semiconductor Device Manufacturing VIII. Proceedings of the International Symposium
dc.source.conferencedate12/10/2003
dc.source.conferencelocationOrlando, FL USA
imec.availabilityPublished - open access
imec.internalnotesElectrochemical Society Proceedings; Vol. 2003-26


Files in this item

Thumbnail

This item appears in the following collection(s)

Show simple item record