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Etching profiles at InP mask edges: some fundamental aspects

dc.contributor.authorVermeir, I. E.
dc.contributor.authorGomes, W. P.
dc.contributor.authorVan Daele, P.
dc.date.accessioned2021-09-29T13:24:26Z
dc.date.available2021-09-29T13:24:26Z
dc.date.issued1995
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/995
dc.sourceIIOimport
dc.titleEtching profiles at InP mask edges: some fundamental aspects
dc.typeProceedings paper
dc.source.peerreviewno
dc.source.beginpage262
dc.source.endpage269
dc.source.conferenceProceedings of the Symposium on Wide Bandgap Semiconductors and Devices and the 23rd State-of-the-Art Program on Compound Semico
dc.source.conferencelocation
imec.availabilityPublished - imec


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