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Influence of the electron mean free path on the resistivity of thin metal films

dc.contributor.authorZhang, Wenqi
dc.contributor.authorBrongersma, Sywert
dc.contributor.authorRichard, Olivier
dc.contributor.authorBrijs, Bert
dc.contributor.authorPalmans, Roger
dc.contributor.authorFroyen, Ludo
dc.contributor.authorMaex, Karen
dc.date.accessioned2021-10-15T18:15:24Z
dc.date.available2021-10-15T18:15:24Z
dc.date.issued2004
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/9977
dc.sourceIIOimport
dc.titleInfluence of the electron mean free path on the resistivity of thin metal films
dc.typeJournal article
dc.contributor.imecauthorBrongersma, Sywert
dc.contributor.imecauthorRichard, Olivier
dc.contributor.imecauthorMaex, Karen
dc.contributor.orcidimecBrongersma, Sywert::0000-0002-1755-3897
dc.contributor.orcidimecRichard, Olivier::0000-0002-3994-8021
dc.source.peerreviewno
dc.source.beginpage146
dc.source.endpage152
dc.source.journalMicroelectronic Engineering
dc.source.issue1_4
dc.source.volume76
imec.availabilityPublished - imec
imec.internalnotesMaterials for Advanced Metallization; March 2004, Brussels, Belgium.


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