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Solid state MAS NMR spectroscopic characterization of plasma damage and UV modification of low-k dielectric films

dc.contributor.authorAbell, Thomas
dc.contributor.authorHouthoofd, Kristof
dc.contributor.authorIacopi, Francesca
dc.contributor.authorGrobet, Piet
dc.contributor.authorMaex, Karen
dc.date.accessioned2021-10-16T00:42:19Z
dc.date.available2021-10-16T00:42:19Z
dc.date.issued2005
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/9991
dc.sourceIIOimport
dc.titleSolid state MAS NMR spectroscopic characterization of plasma damage and UV modification of low-k dielectric films
dc.typeProceedings paper
dc.contributor.imecauthorMaex, Karen
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage35
dc.source.endpage40
dc.source.conferenceMaterials, technology, and Reliability of Advanced Interconnects
dc.source.conferencedate28/03/2005
dc.source.conferencelocationSan Francisco, CA USA
imec.availabilityPublished - open access
imec.internalnotesMRS Symposium Proceedings; Vol. 863


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