Browsing by Author "Abe, Yuuichi"
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Publication High accuracy OPC-modeling by using advanced CD-SEM based contours in the next generation lithography
;Hibino, Daisuke ;Shindo, Hiroyuki ;Abe, Yuuichi ;Hojyo, Yutaka ;Fenger, GermainDo, ThuyProceedings paper2010, Metrology, Inspection and Process Control for Microlithography XXIV, 21/02/2010, p.76381X