Browsing by Author "Aksenov, Yuri"
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Publication Impact of hyper-NA reticle properties on ArF immersion lithography
Proceedings paper2004-12, Proceedings SEMICON Japan, 1/12/2004, p.Jan-15-Jan-21Publication Mask-induced polarization effects at high NA
Proceedings paper2005-03, Optical Microlithography XVIII, 28/02/2005, p.555-566Publication Progress in 193nm immersion lithography at IMEC
Proceedings paper2005-01, EMLC- 21th European Mask and Lithography Conference, 31/01/2005, p.26-29Publication Progress in 193nm immersion lithography at IMEC
Proceedings paper2005, 21st European Mask and Lithography Conference, 31/01/2005, p.6-12