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Browsing by Author "Besmehn, A."

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    Reduction of silicon dioxide interfacial layer to 4.6 Å EOT by Al remote scavenging in high-j/metal gate stacks on Si

    Nichau, Alexander
    ;
    Schafer, A.
    ;
    Knoll, L.
    ;
    Wirths, S.
    ;
    Schram, Tom  
    ;
    Ragnarsson, Lars-Ake  
    Journal article
    2013, Microelectronic Engineering, 109, p.103-112

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