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Reduction of silicon dioxide interfacial layer to 4.6 Å EOT by Al remote scavenging in high-j/metal gate stacks on Si

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1 since deposited on 2021-10-21
Acq. date: 2025-12-09

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1927 since deposited on 2021-10-21
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Acq. date: 2025-12-09

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1 since deposited on 2021-10-21
Acq. date: 2025-12-09

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1927 since deposited on 2021-10-21
1last month
Acq. date: 2025-12-09

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