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Reduction of silicon dioxide interfacial layer to 4.6 Å EOT by Al remote scavenging in high-j/metal gate stacks on Si
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1 since deposited on 2021-10-21
Acq. date: 2025-10-24
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1921 since deposited on 2021-10-21
Acq. date: 2025-10-24
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1 since deposited on 2021-10-21
Acq. date: 2025-10-24
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1921 since deposited on 2021-10-21
Acq. date: 2025-10-24
Citations