Browsing by Author "Bhouri, Nada"
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Publication Asymmetric relaxation of SiGe in patterned Si line structures
Proceedings paper2007, International Conference on Frontiers of Characterization and Metrology for Nanoelectronics at NIST, 27/03/2007Publication Influence of the highly-doped drain implantation and the window size on defect creation in p/n Si1-xGex source/drain junctions
;Chowdhury, Mohammad KamruzzamanVissouvanadin Soubaretty, BertrandProceedings paper2008, Gettering and Defect Engineering in Semiconductor Technology XII, 14/10/2007, p.95-100Publication pMOS transistor with embedded SiGe: elastic and plastic relaxation issues
Meeting abstract2007, 5th International Conference on Silicon Epitaxy and Heterostructures - ICSI-5, 20/05/2007, p.145-146Publication pMOS transistor with embedded SiGe: elastic and plastic relaxation issues
Journal article2008, Thin Solid Films, (517) 1, p.113-116Publication Relaxation induced excess leakage current in recessed Si1-xGex source/drain junctions
Proceedings paper2007, Advanced Gate Stack, Source/Drain and Channel Engineering for Si-based CMOS 3: New Materials, Processes and Equipment, 6/05/2007, p.389-396