Browsing by Author "Biafore, J."
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Publication Comparative stochastic process variation bands for N7, N5, and N3 at EUV
Proceedings paper2018, Extreme Ultraviolet (EUV) Lithography IX, 12/02/2018, p.105830KPublication Lithographic performance of 193 nm single and bi-layer materials
Journal article1998, Journal of Photopolymer Science and Technology, (11) 3, p.513-23