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    Comparison of SiO2 and HfO2/SiO2 gate stacks electrical behaviour at a nanometre scale

    Blasco, Xavier
    ;
    Nafria, M.
    ;
    Aymerich, X.
    ;
    Vandervorst, Wilfried  
    Journal article
    2005, Electronics Letters, (41) 12, p.719-721

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