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Comparison of SiO2 and HfO2/SiO2 gate stacks electrical behaviour at a nanometre scale
Publication:
Comparison of SiO2 and HfO2/SiO2 gate stacks electrical behaviour at a nanometre scale
Date
2005
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Blasco, Xavier
;
Nafria, M.
;
Aymerich, X.
;
Vandervorst, Wilfried
Journal
Electronics Letters
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1883
since deposited on 2021-10-16
Acq. date: 2025-10-23
Citations
Metrics
Views
1883
since deposited on 2021-10-16
Acq. date: 2025-10-23
Citations