Publication:
Comparison of SiO2 and HfO2/SiO2 gate stacks electrical behaviour at a nanometre scale
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1904 since deposited on 2021-10-16
7last month
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Acq. date: 2026-08-06
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Statistics
Views
1904 since deposited on 2021-10-16
7last month
2last week
Acq. date: 2026-08-06
Citations