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Browsing by Author "Bourtault, S."

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    Spectroscopic ellipsometry in the VUV range applied to the characterization of atomic layer deposited HfO2,Al2O3 and HfAlOx thin layers for high k dielectrics

    Boher, P.
    ;
    Defranoux, C.
    ;
    Bourtault, S.
    ;
    Piel, J.P.
    ;
    Bender, Hugo  
    Proceedings paper
    2003, Analytical and Diagnostic Techniques for Semiconductor Materials, Devices and Processes, 27/04/2003, p.305-315

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