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Spectroscopic ellipsometry in the VUV range applied to the characterization of atomic layer deposited HfO2,Al2O3 and HfAlOx thin layers for high k dielectrics
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2082 since deposited on 2021-10-15
Acq. date: 2025-10-25
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Views
2082 since deposited on 2021-10-15
Acq. date: 2025-10-25
Citations