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Browsing by Author "Bradon, Neil"

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    EUV process sensitivities and optimizations for track processing

    Shite, Hideo
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    Bradon, Neil
    ;
    Nafus, Kathleen  
    ;
    Kitano, Junichi
    ;
    Kosugi, Hitoshi
    ;
    Hermans, Jan  
    Proceedings paper
    2010, International Symposium on Extreme Ultraviolet Lithography, 18/10/2010
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    EUV processing investigation on state-of-the-art coater/developer system

    Shite, Hideo
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    Bradon, Neil
    ;
    Shimoaoki, T.
    ;
    Kobayashi, S.
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    Nafus, Kathleen  
    ;
    Kosugi, Hitoshi
    Proceedings paper
    2011, Extreme Ultravoiolet (EUV) Lithography II, 27/02/2011, p.796937
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    EUV RLS performance tradeoffs for a polymer bound PAG resist process

    Rathsack, Ben
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    Hooge, Josh
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    Somervell, Mark
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    Scheer, Steve
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    Nafus, Kathleen  
    ;
    Shite, Hideo
    Proceedings paper
    2009, International Symposium on Extreme Ultraviolet Lithography, 18/10/2009
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    Further investigation of EUV process sensitivities for wafer track processing

    Bradon, Neil
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    Nafus, Kathleen  
    ;
    Shite, Hideo
    ;
    Kitano, J.
    ;
    Kosugi, H.
    ;
    Goethals, Mieke
    Proceedings paper
    2010, Extreme Ultraviolet (EUV) Lithography, 21/02/2010, p.763630
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    Investigation of EUV process sensitivities for wafer track processing

    Bradon, Neil
    ;
    Weichert, Heiko
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    Nafus, Kathleen  
    ;
    Hatakeyama, Shinichi
    ;
    Kitano, J.
    ;
    Kosugi, H.
    Proceedings paper
    2009, Alternative Lithographic Technologies, 22/02/2009, p.727148

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