Browsing by Author "Bran, M."

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A theoretical and experimental study of damage-free BEOL cleaning with megasonic agitation

Lauerhaas, Jeff
;
Wu, Y.
;
Bran, M.
;
Fraser, B.
;
Brause, E.
;
Nicolosi, T.
Proceedings paper
2003, Ultra Clean Processing of Silicon Surfaces 2002 - UCPSS, 16/09/2002, p.151-157
Single wafer cleaning and drying: particle removal via a non-contact, non-damaging megasonic clean followed by a high performance "Rotagoni" dry

Lauerhaas, Jeff
;
Mertens, Paul
;
Fyen, Wim
;
Kenis, Karine
;
Meuris, Marc
;
Nicolosi, T.
;
Bran, M.
Proceedings paper
2000, Proceedings of the 9th International Symposium on Semiconductor Manufacturing - ISSM, 26/09/2000, p.157-160