Browsing by Author "Breimer, P."

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Atomistic modeling of impurity ion implantation in ultra-thin-body Si devices

Pelaz, L.
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Duffy, Ray
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Aboy, M.
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Marques, L.
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Lopez, P.
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Santos, I.
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Pawlak, Bartek
;
Van Dal, Mark
Proceedings paper
2008, IEEE International Electron Devices Meeting - IEDM, 15/12/2008, p.535-538
Properties of ALD HfTaxOy high-k layers deposited on chemical silicon oxide

Zhao, Chao
;
Witters, Thomas
;
Breimer, P.
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Maes, Jan
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Caymax, Matty
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De Gendt, Stefan
Journal article
2007, Microelectronic Engineering, (84) 1, p.7-10
Properties of HfTaxOy high-k layers deposited by ALCVD

Zhao, Chao
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Rittersma, Z.M.
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van Berkum, J.G.M.
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Snijders, J.H.M.
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Hendriks, A.
;
Breimer, P.
Proceedings paper
2005, Advanced Gate Stack, Source/Drain, and Channel Engineering for Si-Based CMOS: New Materials, Processes, and Equipment, 15/05/2005, p.133-140