Browsing by Author "Bruggeman, B."
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Publication Optimisation methodology towards a manufacturable 0.3 μm poly-gate process using i-line lithography
Proceedings paper1996, Proceedings of the Microlithography Seminar INTERFACE, 27/10/1996, p.223-246Publication SEM proximity effect for poly gate patterns
Journal article1997, Microlithography World, (6) 4, p.5-10Publication Strategies to improve linewidth control for 0.25 µm and 0.18 µm devices
Journal article1996, Journal of Photopolymer Science and Technology, (9) 3, p.399-424