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    Tuning and simulating a 193nm resist for 2D applications

    Howard, W.
    ;
    Wiaux, Vincent  
    ;
    Ercken, Monique  
    ;
    Bui, B.
    ;
    Byers, J.D.
    ;
    Pochkowski, M.
    Proceedings paper
    2002, Optical Microlithography XV, 5/03/2002, p.1190-1198

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