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Browsing by Author "Buxbaum, Alex"

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    Impact of AAPSM etch depth linearity in ArF immersion lithography

    Cangemi, Michael
    ;
    Philipsen, Vicky  
    ;
    Leunissen, Peter
    ;
    De Ruyter, Rudi  
    ;
    Jonckheere, Rik  
    Proceedings paper
    2005, 2nd International Symposium on Immersion Lithography, 12/09/2005
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    Through-pitch characterization and printability for 65nm half-pitch alternating aperture phase shift applications

    Philipsen, Vicky  
    ;
    Leunissen, Peter
    ;
    De Ruyter, Rudi  
    ;
    Jonckheere, Rik  
    ;
    Martin, Patrick
    Proceedings paper
    2005, Photomask and Next-Generation Lithography Mask Technology XII, 13/04/2005, p.211-222

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