Browsing by Author "Chang, S.Z."
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Publication Achieving Low-VT Ni-FUSI CMOS by ultra-thin Dy2O3 capping of hafnium silicate dielectrics
Journal article2007, IEEE Electron Device Letters, (28) 11, p.980-983Publication High-k/ metal-gate stack work-function tuning by rare-earth capping layers: interface dipole or bulk charge?
Proceedings paper2009, International Symposium on VLSI Technology, Systems, and Applications - VLSI-TSA, 27/04/2009, p.69-70