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Browsing by Author "Chen, A.C."

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    The magnitude of potential exposure-tool-induced critical dimension and overlay errors in double dipole lithography for the 65-nm and 45-nm technology nodes

    Chiou, T.B.
    ;
    Chen, A.C.
    ;
    Tseng, S.E.
    ;
    Eurlings, M.
    ;
    Hendrickx, Eric  
    ;
    Hsu, S.
    Journal article
    2004, Japanese Journal of Applied Physics. Part 1: Regular Papers, (43) 6B, p.3672-3679

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