Browsing by Author "Claes, M."
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Publication Controlled deposition of organic contamination and removal with ozone-based cleaning
Journal article2001, Journal of the Electrochemical Society, (148) 3, p.G118-125Publication Determination of degradation products in O3/DI processes
Oral presentation2001, 15th World Congress of the International Ozone Association; 10-15 September 2001; London, UK.Publication Developments in cleaning technology for critical layers
Oral presentation2000, Santa Clara Plastics Symposium on Cleaning Technology; May 2000Publication Making the cleaner greener
Publication Ozonated HF applications in a spray processing tool
Meeting abstract2001, 200th Meeting of the Electrochemical Society: 7th International Symposium on Cleaning Technology in Semiconductor Device Manufac, 2/09/2001Publication Quantification problems in light element determination by grazing emission X-ray fluorescence
Journal article2000, Journal of Analytical Atomic Spectrometry, (15) 4, p.415-421Publication Removal of photoresist by O3DI water processes: determination of degradation products
Meeting abstract2001, 200th Meeting of the Electrochemical Society: 7th International Symposium on Cleaning Technology in Semiconductor Device Manufac, 2/09/2001Publication The increasing importance of the use of ozone in micro-electronics industry
Oral presentation2001, 15th World Congress of the International Ozone Association; 10-15 September 2001; London, UK.Publication The removal of organic contamination by O3/DI water processes: a theoretical study
Meeting abstract2001, 200th Meeting of the Electrochemical Society: 7th International Symposium on Cleaning Technology in Semiconductor Device Manufac, 2/09/2001Publication Use of grazing emission XRF for silicon wafer surface contamination measurements
Proceedings paper1996, Proceedings of the 3rd International Symposium on Ultra Clean Processing of Silicon Surfaces - UCPSS, 23/09/1996, p.57-60