Browsing by Author "Collart, E.H.J."

Now showing 1 - 3 of 3

Damage accumulation and dopant migration during shallow As and Sb implantation into Si

Werner, M.
;
van den Berg, J.A.
;
Armour, D.G.
;
Vandervorst, Wilfried
;
Collart, E.H.J.
Journal article
2004, Nuclear Instruments & Methods in Physics Research B, 216, p.67-74
High depth resolution characterization of the damage and annealing behaviour of ultrashallow As-implants in Si

van den Berg, J.A.
;
Armour, D.G.
;
Werner, M.
;
Whelan, S.
;
Vandervorst, Wilfried
;
Clarysse, Trudo
Proceedings paper
2002, Proceedings 14th International Conference on Ion Implantation Technology Conference, 22/09/2002, p.597-600
Sub nanometer depth resolution profiling of the evolution and annealing of damage and the dopant redistribution of ultra-shallow As and Sb implants in Si

van den Berg, J.A.
;
Werner, M.
;
Armour, D.G.
;
Vandervorst, Wilfried
;
Clarysse, Trudo
Meeting abstract
2003, Ultra Shallow Junctions. 7th Int. Worksh. Fabrication, Characterization and Modeling of Ultra Shallow Doping Profiles in Semic., 27/04/2003, p.446