Browsing by Author "Crane, R."

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Highly chemical reactive ion etching of gallium nitride

Karouta, F.
;
Jacobs, B.
;
Moerman, I.
;
Jacobs, K.
;
Weyher, J.L.
;
Porowski, S.
;
Crane, R.
;
Hageman, P.R.
Proceedings paper
2000, GaN and Related Alloys, 28/11/1999, p.W11.76
Highly chemical reactive ion etching of gallium nitride

Karouta, F.
;
Jacobs, B.
;
Moerman, Ingrid
;
Jacobs, Koen
;
Weyher, J. L.
;
Nowak, G.
;
Crane, R.
Journal article
2000, MRS Internet Journal of Nitride Semiconductor Research, 5S1, p.W11.76