Browsing by Author "Cunniffe, John"
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Publication Materials issues of Ni fully silicided (FUSI) gates for CMOS applications
Proceedings paper2005-05, Advanced Gate Stack, Source/Drain, and Channel Engineering for Si-Based CMOS: New Materials, Processes, and Equipment, 16/05/2005, p.225-232Publication Self-aligned PtSi fully silicided (FUSI) metal gates for 45 nm CMOS applications
Proceedings paper2005-05, Advanced Gate Stack, Source/Drain, and Channel Engineering for Si-Based CMOS: New Materials, Processes, and Equipment, 16/05/2005, p.233-240