Publication:

Materials issues of Ni fully silicided (FUSI) gates for CMOS applications

Date

2005-05
Proceedings Paper
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Author(s)

Kittl, Jorge
;
Lauwers, Anne  
;
Kmieciak, Malgorzata
;
Demeurisse, Caroline  
;
Kottantharayil, Anil
;
Veloso, Anabela  
;
Van Dal, Mark  
;
Schram, Tom  
;
Brijs, Bert
;
Kaiser, M.
;
Kubicek, Stefan  
;
Cunniffe, John
;
Verbeeck, Rita  
;
Vrancken, Christa  
;
Biesemans, Serge  
;
Maex, Karen  

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