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Materials issues of Ni fully silicided (FUSI) gates for CMOS applications
Publication:
Materials issues of Ni fully silicided (FUSI) gates for CMOS applications
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Date
2005
Proceedings Paper
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Kittl, Jorge
;
Lauwers, Anne
;
Kmieciak, Malgorzata
;
Demeurisse, Caroline
;
Kottantharayil, Anil
;
Veloso, Anabela
;
Van Dal, Mark
;
Schram, Tom
;
Brijs, Bert
;
Kaiser, M.
;
Kubicek, Stefan
;
Cunniffe, John
;
Verbeeck, Rita
;
Vrancken, Christa
;
Biesemans, Serge
;
Maex, Karen
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1949
since deposited on 2021-10-16
Acq. date: 2026-07-15
Citations
Statistics
Views
1949
since deposited on 2021-10-16
Acq. date: 2026-07-15
Citations