Browsing by Author "De Ruyter, Rudi"
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Publication Assessment of EUV reticle blank availability enabling the use of EUV tools today and in the future
Proceedings paper2007, 23rd European Mask and Lithography Conference - EMLC, 23/01/2007, p.653313Publication EUV single patterning for logic metal layers: achievement and challenge
Proceedings paper2017, International Conference on Extreme Ultraviolet Lithography, 17/09/2017, p.1045004Publication Impact of AAPSM etch depth linearity in ArF immersion lithography
Proceedings paper2005, 2nd International Symposium on Immersion Lithography, 12/09/2005Publication Mask blank stress birefringence requirements for hyper-NA lithography
Proceedings paper2005, 193 Immersion Symposium, 12/09/2005Publication Through-pitch characterization and printability for 65nm half-pitch alternating aperture phase shift applications
Proceedings paper2005, Photomask and Next-Generation Lithography Mask Technology XII, 13/04/2005, p.211-222