Browsing by Author "De Waele, Rita"
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Publication Advanced wafer surface cleaning technology
Oral presentation2004, SEMICON Korea 2004 STS, S5: Contamination-free Manufacturing SeminarPublication Quantitative modeling of H2O2 decomposition in SC1
Proceedings paper1998, Proceedings of the 5th International Symposium on Cleaning Technology in Semiconductor Device Manufacturing, 31/08/1997, p.176-183Publication Wafer backside cleaning strategies for high-k/metal gate processing
; ; ; ; Kraus, HaraldOral presentation2004, 7th International Symposium Ultra-clean Processing of Silicon - UCPSSPublication Wafer backside cleaning strategies for high-k/metal gate processing
; ; ; ; Kraus, HaraldProceedings paper2005, Ultra Clean Processing of Silicon Surfaces VII: Proceedings of the 7th International Symposium, 20/09/2004, p.241-244