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Browsing by Author "Demmerle, W."

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    Accurate EUV lithography simulation enabled by calibrated physical resist models

    Klostermann, U.K.
    ;
    Mulders, T.
    ;
    Schmoeller, T.
    ;
    Demmerle, W.
    ;
    Lorusso, Gian  
    ;
    Hendrickx, Eric  
    Journal article
    2010-09, Solid State Technology

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