Browsing by Author "Dietze, Uwe"
Now showing 1 - 6 of 6
- Results Per Page
- Sort Options
Publication Effective EUVL mask cleaning technology solutions for mask manufacturing and in-fab mask maintenance
Proceedings paper2011, 27th European Mask and Lithography Conference - EMLC, 18/01/2011, p.79850NPublication Effective solutions for in-fab EUVL mask cleaning
Proceedings paper2010, International Symposium on Extreme Ultraviolet Lithography, 20/10/2010Publication Integrated cleaning and handling automation of NXE3100 reticles
Proceedings paper2012, 28th European Mask and Lithography Conference, 17/01/2012, p.83520UPublication Optimization of EUV reticle cleaning by evaluation of chemistries on wafer-based mimic test structures.
Proceedings paper2016, Ultra Clean Processing of Semiconductor Surfaces XIII - UCPSS, 11/09/2016, p.357Publication Preserving printed wafer CD stability in high-frequency EUVL mask cleaning
Proceedings paper2011, International Symposium on Extreme Ultraviolet Lithography - EUVL, 17/10/2011Publication Techniques for removal of contamination from EUVL mask without surface damage
Proceedings paper2010, Extreme Ultraviolet (EUV) Lithography, 21/02/2010, p.76360Y