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Browsing by Author "Dillen, Harm"

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    CD-SEM distortion quantification for EPE metrology and contour analysis

    Dillen, Harm
    ;
    Kiers, Ton
    ;
    Halder, Sandip  
    ;
    Wallow, Thomas I.
    ;
    Van Roey, Frieda  
    Proceedings paper
    2017, Metrology, Inspection, and Process Control for Microlithography XXXI, 26/02/2017, p.1014515
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    Feature grouping to enable edge placement error-aware process control in multi-feature logic use case

    Schelcher, Guillaume  
    ;
    Athayde, Marsil
    ;
    Schoofs, Stijn  
    ;
    Hsia, Jeff
    ;
    Khalik, Zuan
    ;
    Li, Fahong
    Proceedings paper
    2024, Conference on Metrology, Inspection, and Process Control XXXVIII, FEB 26-29, 2024, p.Art. 129550O
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    Pattern selection strategy by clustering for logic EPE monitoring

    Anunciado, Roy
    ;
    Nechaev, Konstantin
    ;
    Sahraeian, Reza
    ;
    Schouwenberg, Jeroen
    Proceedings paper
    2024, 2024 International Conference on Extreme Ultraviolet Lithography, SEP 30-OCT 03, 2024, p.Art. 1321508

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