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Browsing by Author "Ebeling, Rob"

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    Lifetime test on EUV photomask with EBL2

    Wu, Chien-ching
    ;
    Bender, Markus
    ;
    Jonckheere, Rik  
    ;
    Scholze, Frank
    ;
    Bekman, Herman
    Proceedings paper
    2019-05, Photomask Japan 2019: XXVI Symposium on Photomask and Next-Generation Lithography Mask Technology, 16/04/2019, p.111780E
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    Novel metrology for mask degradation: IR-AFM, XPS depth profiling and HAXPES

    de Rooij-Lohmann, Veronique
    ;
    Mukherjee, Shriparna
    ;
    Wu, Chien-Ching
    ;
    Ebeling, Rob
    ;
    Pandey, Komal
    Proceedings paper
    2024, 2024 Conference on Photomask Technology, 2024-09-29, p.132160Y

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