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Browsing by Author "Engelen, A."

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    Impact of high order aberrations on the performance of the aberration monitor

    Dirksen, P.
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    Juffermans, C.
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    Engelen, A.
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    De Bisschop, Peter  
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    Muellerke, H.
    Proceedings paper
    2000, Optical Microlithography XIII, 1/03/2000, p.9-17
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    Implementation of pattern-specific illumination pupil optimization on Step & Scan systems

    Engelen, A.
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    Socha, R.
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    Hendrickx, Eric  
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    Scheepers, W.
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    Nowak, F.
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    van Dam, M.
    ;
    Liebchen, Armin
    Proceedings paper
    2004, Optical Microlithography XVII, 22/02/2004, p.1323-1333
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    Separable models for computational lithography

    Liu, Hua-Yu
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    Zhao, Q.
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    Chen, J.F.
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    Jiang, J.
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    Socha, B.
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    Van Setten, E.
    ;
    Engelen, A.
    ;
    Meessen, J.
    Proceedings paper
    2008, Photomask and Next-Generation Lithography Mask Technology XV, 16/04/2008, p.70280X

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