Browsing by Author "Enomoto, Masashi"

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Novel technologies in coater/developer to enhance the CD stability and to improve the defectivity toward N7 and smaller nodes

Kamei, Yuya
;
Sano, Yohei
;
Yamauchi, Takashi
;
Kawakami, Shinichiro
;
Tadokoro, Masahide
Proceedings paper
2019, Extreme Ultraviolet (EUV) Lithography X, 24/02/2019, p.109571P
Resist coating and developing process technology toward EUV manufacturing sub 7nm node

Kamei, Yuya
;
Shiozawa, Takahiro
;
Kawakami, Shinichiro
;
Shite, Hideo
;
Ichinomiya, Hiroshi
Proceedings paper
2018, International Symposium on Semiconductor Manufacturing (ISSM), 10/12/2018, p.1-4
Technology for defectivity improvement in resist coating and developing process in EUV lithography process

Kamei, Yuya
;
Shiozawa, Takahiro
;
Kawakami, Shinichiro
;
Shite, Hideo
;
Ichinomiya, Hiroshi
Proceedings paper
2017, Extreme Ultraviolet (EUV) Lithography VIII, 26/02/2017, p.1014326