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Resist coating and developing process technology toward EUV manufacturing sub 7nm node
Publication:
Resist coating and developing process technology toward EUV manufacturing sub 7nm node
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Date
2018
Proceedings Paper
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42026.pdf
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Basic data
APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Kamei, Yuya
;
Shiozawa, Takahiro
;
Kawakami, Shinichiro
;
Shite, Hideo
;
Ichinomiya, Hiroshi
;
Hashimoto, Yusaku
;
Enomoto, Masashi
;
Nafus, Kathleen
;
Sonoda, Akihiko
;
Demand, Marc
;
Foubert, Philippe
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1936
since deposited on 2021-10-25
1
last month
Acq. date: 2025-12-12
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Metrics
Views
1936
since deposited on 2021-10-25
1
last month
Acq. date: 2025-12-12
Citations