Publication:

Resist coating and developing process technology toward EUV manufacturing sub 7nm node

Date

2018
Proceedings Paper
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dc.contributor.authorKamei, Yuya
dc.contributor.authorShiozawa, Takahiro
dc.contributor.authorKawakami, Shinichiro
dc.contributor.authorShite, Hideo
dc.contributor.authorIchinomiya, Hiroshi
dc.contributor.authorHashimoto, Yusaku
dc.contributor.authorEnomoto, Masashi
dc.contributor.authorNafus, Kathleen
dc.contributor.authorSonoda, Akihiko
dc.contributor.authorDemand, Marc
dc.contributor.authorFoubert, Philippe
dc.contributor.imecauthorNafus, Kathleen
dc.contributor.imecauthorDemand, Marc
dc.contributor.imecauthorFoubert, Philippe
dc.date.accessioned2021-10-25T20:40:21Z
dc.date.available2021-10-25T20:40:21Z
dc.date.embargo9999-12-31
dc.date.issued2018
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/31006
dc.identifier.urlhttps://ieeexplore.ieee.org/document/8651154
dc.source.beginpage1
dc.source.conferenceInternational Symposium on Semiconductor Manufacturing (ISSM)
dc.source.conferencedate10/12/2018
dc.source.conferencelocationTokyo Japan
dc.source.endpage4
dc.title

Resist coating and developing process technology toward EUV manufacturing sub 7nm node

dc.typeProceedings paper
dspace.entity.typePublication
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