Browsing by Author "Estroff, Andrew"
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Publication Mask-induced polarization effects at high NA
Proceedings paper2005-03, Optical Microlithography XVIII, 28/02/2005, p.555-566Publication Source polarization and OPC effects on illumination optimization
Publication Validation of immersion lithography OPC model accuracy
Proceedings paper2005, 2nd International Symposium on Immersion Lithography, 12/09/2005