Browsing by Author "Eurlings, M."
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Publication Creative metrology development for EUVL: Flare and out-of-band qualification
Oral presentation2011, 55th International conference on Electron, Ion and Photon Beam Technology and Nanofabrication - EIPBNPublication Development of automatic OPC treatment and layout decomposition for double dipole lithography for low K1-imaging
Proceedings paper2005, Advanced Microlithographic Technologies, 8/11/2004, p.21-31Publication Experimental verification of a model based decomposition method for double dipole lithography
; Publication The magnitude of potential exposure-tool-induced critical dimension and overlay errors in double dipole lithography for the 65-nm and 45-nm technology nodes
Journal article2004, Japanese Journal of Applied Physics. Part 1: Regular Papers, (43) 6B, p.3672-3679