Browsing by Author "Eurlings, Mark"
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Publication Deep ultraviolet out-of-band contribution in extreme ultraviolet lithography: predictions and experiments
Proceedings paper2011, Extreme Utltraviolet (EUV) Lithography II, 27/02/2011, p.79692OPublication Double dipole lithography for 65-nm node and beyond: a technology readiness review
Proceedings paper2004-08, Photomask and Next-Generation Lithography Mask Technology XI, 14/04/2004, p.481-498