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Double dipole lithography for 65-nm node and beyond: a technology readiness review
Publication:
Double dipole lithography for 65-nm node and beyond: a technology readiness review
Date
2004-08
Proceedings Paper
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9987.pdf
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Basic data
APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Hsu, Stephen
;
Eurlings, Mark
;
Hendrickx, Eric
;
Van Den Broeke, Douglas J.
;
Chiou, Tsann-Bim
;
Fung Chen, J.
;
Laidig, Thomas L.
;
Shi, Xuelong
;
Finders, Jo
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2050
since deposited on 2021-10-15
Acq. date: 2025-10-23
Citations
Metrics
Views
2050
since deposited on 2021-10-15
Acq. date: 2025-10-23
Citations