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Browsing by Author "Fonda, Emiliano"

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    Study of deposition behavior of thermal/plasma-enhanced chemical vapor deposition (CVD/PECVD) of manganese on porous SiCOH low-k dielectric materials for copper diffusion barrier application in advanced interconnect technology

    Jourdan, Nicolas  
    ;
    Baklanov, Mikhaïl
    ;
    Meersschaut, Johan  
    ;
    Vereecke, Guy  
    ;
    Conard, Thierry  
    Meeting abstract
    2012, MRS Spring Symposium C: Interconnect Challenges for CMOS Technology, 9/04/2012, p.C4.2

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