Browsing by Author "Fonda, Emiliano"
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Publication Study of deposition behavior of thermal/plasma-enhanced chemical vapor deposition (CVD/PECVD) of manganese on porous SiCOH low-k dielectric materials for copper diffusion barrier application in advanced interconnect technology
Meeting abstract2012, MRS Spring Symposium C: Interconnect Challenges for CMOS Technology, 9/04/2012, p.C4.2