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Browsing by Author "Gehoel-van Ansem, W. F."

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    Process optimization for sub-100-nm gate patterns using phase edge lithography

    van Ingen Schenau, K.
    ;
    Vleeming, Bert
    ;
    Gehoel-van Ansem, W. F.
    ;
    Wong, P.
    ;
    Vandenberghe, Geert  
    Proceedings paper
    2001, Advances in Resist Technology and Processing XVIII, 26/02/2001, p.200-211

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