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Browsing by Author "George, R. A."

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    ArF step-and-scan exposure system for 0.15-μm and 0.13-μm technology nodes

    Mulkens, J.
    ;
    Stoeldraijer, J.
    ;
    Davies, G.
    ;
    Dierichs, M.
    ;
    Heskamp, B.
    ;
    Moers, M. H.
    ;
    George, R. A.
    Proceedings paper
    1999, Optical Microlithography XII, 14/03/1999, p.506-521

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