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ArF step-and-scan exposure system for 0.15-μm and 0.13-μm technology nodes
Publication:
ArF step-and-scan exposure system for 0.15-μm and 0.13-μm technology nodes
Date
1999
Proceedings Paper
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3653.pdf
2 MB
Basic data
APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Mulkens, J.
;
Stoeldraijer, J.
;
Davies, G.
;
Dierichs, M.
;
Heskamp, B.
;
Moers, M. H.
;
George, R. A.
;
Roempp, O.
;
Glatzel, H.
;
Wagner, C.
;
Pollers, Ingrid
;
Jaenen, Patrick
Journal
Abstract
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2
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Acq. date: 2025-10-25
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since deposited on 2021-10-14
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item.page.metrics.field.last-week
Acq. date: 2025-10-25
Citations
Metrics
Downloads
2
since deposited on 2021-10-14
Acq. date: 2025-10-25
Views
1990
since deposited on 2021-10-14
425
item.page.metrics.field.last-week
Acq. date: 2025-10-25
Citations