ArF step-and-scan exposure system for 0.15-μm and 0.13-μm technology nodes

Mulkens, J.; Stoeldraijer, J.; Davies, G.; Dierichs, M.; Heskamp, B.; Moers, M. H.; George, R. A.; Roempp, O.; Glatzel, H.; Wagner, C.; Pollers, Ingrid; Jaenen, Patrick

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ArF step-and-scan exposure system for 0.15-μm and 0.13-μm technology nodes

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1999

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2 since deposited on 2021-10-14

Acq. date: 2025-12-11

1993 since deposited on 2021-10-14

Acq. date: 2025-12-11

ArF step-and-scan exposure system for 0.15-μm and 0.13-μm technology nodes

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