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Browsing by Author "Ghekiere, John"

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    Alternative post-etch polymer removal in a single-wafer platform

    Dundas, C.
    ;
    Vroom, R.
    ;
    Ghekiere, John
    ;
    Van Doorne, Patrick
    ;
    Rink, I.
    ;
    Sharp, I.
    ;
    Heffernan, S.
    Proceedings paper
    2003, Ultra Clean Processing of Silicon Surfaces 2002 - UCPSS, 16/09/2002, p.247-251
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    Effective post-etch residue removal on low-k films using single wafer processing

    Kesters, Els  
    ;
    Ghekiere, John
    ;
    Van Doorne, Patrick
    ;
    Vereecke, Guy  
    ;
    Mertens, Paul  
    ;
    Heyns, Marc  
    Meeting abstract
    2003, 204th Meeting of the Electrochemical Society: 8th Int. Symp. on Cleaning Technology in Semiconductor Device Manufacturing, 13/10/2003
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    Effective post-etch residue removal on low-K films using single wafer processing

    Kesters, Els  
    ;
    Ghekiere, John
    ;
    Van Doorne, Patrick
    ;
    Vereecke, Guy  
    ;
    Mertens, Paul  
    ;
    Heyns, Marc  
    Proceedings paper
    2004, Cleaning Technology in Semiconductor Device Manufacturing VIII. Proceedings of the International Symposium, 13/10/2003, p.15-22

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