Browsing by Author "Glatzel, H."

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Advanced 193 nm step and scan technology

Stoeldraijer, J.
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Mulkens, J.
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Davies, G.
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Sytsma, J.
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Bakker, H.
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Glatzel, H.
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Wagner, C.
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Roempp, O.
Meeting abstract
1998, 4th International Symposium on 193 nm Lithography. Abstracts Book. "193nm '98. At the Peak", 14/09/1998
ArF step-and-scan exposure system for 0.15-μm and 0.13-μm technology nodes

Mulkens, J.
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Stoeldraijer, J.
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Davies, G.
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Dierichs, M.
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Heskamp, B.
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Moers, M. H.
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George, R. A.
Proceedings paper
1999, Optical Microlithography XII, 14/03/1999, p.506-521